Development on Pad Conditioning Conforming to Pad Surface
نویسندگان
چکیده
منابع مشابه
Pad conditioning in chemical mechanical polishing: a conditioning density distribution model to predict pad surface shape
Abstract: Diamond disc pad conditioning is traditionally employed to restore pad planarity and surface roughness in chemical mechanical polishing (or planarisation) (CMP). In this paper, a conditioning density distribution model is developed to predict the pad surface shape resulted from the diamond disc conditioning in CMP. A kinematic study is carried out to calculate and simulate the diamond...
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In a recent paper Cabay et al. 1996a], the authors develop a fast, iterative, look-ahead algorithm for numerically computingPad e-Hermite systems and simultaneous Pad e systems along a diagonal of the associatedPad e tables. Included there is a detailed error analysis showing that the algorithm is weakly stable. In this paper, we describe a Fortran implementation, VECTOR PADE, of this algorithm...
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9 1School of Medicine & School of Science & Health, University of Western Sydney; Neuroscience 10 Research Australia; MARCS Institute, University of Western Sydney; Dept of Clinical 11 Neurophysiology, Göteborg University, Sweden. 12 13 Address for correspondence: 14 Prof Vaughan G Macefield 15 School of Medicine, University of Western Sydney, Locked Bag 1797 Penrith, NSW 2751, 16 Australia 17 ...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 2010
ISSN: 1882-675X,0912-0289
DOI: 10.2493/jjspe.76.433